Machines by Location: 4F Main-North
Process | Lab | Tool | Process Category | Subcategory | Description | |
---|---|---|---|---|---|---|
TRL | asher-TRL | Photo | Clean | Barrel asher for resist removal | ||
TRL | dek-NoAu | Metrology | Profile | Stylus Profilerometer | ||
TRL | ellipsometer-TRL | Metrology | Thickness | Thin film thickness measurement | ||
TRL | Filmetrics-TRL | Metrology | Thickness | Thin film thickness measurement | ||
TRL | FLX | Metrology | Profile | Thin film stress measurement | ||
TRL | IV-probe | Metrology | Electrical | Probe station with curve tracer for IV measurement | ||
TRL | LAM590-TRL | Etch | RIE | Fluorine based plasma etching of oxide and nitrides | ||
TRL | parylene | Deposition | CVD | Parylene depopsition | ||
TRL | photo-wet-Au | Wet | Solvents | Solvent fume hood with sonicator | ||
TRL | photo-wet-l | Wet | Solvents | Wetbench for photoresist development | ||
TRL | photo-wet-r | Wet | Solvents | Wetbench for photoresist development | ||
TRL | plasmaquest | Etch | RIE | Fluorine and Chlorine general purpose plasma deposition and etch tool | ||
TRL | SAMCO | Etch | RIE | Chlorine based plasma etcher for III-V materials | ||
TRL | WYKO | Metrology | Profile | Optical profiling system |