David Terry
Project Technician
39-312 - (617)253-6291 - dterry@mtl.mit.edu

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Process	Lab	Tool	Process Category	Subcategory	Description	Color Code
+	TRL	acid-hood	Wet	Acids	Acid processing station	Red &Green
+	TRL	asherMatrix-TRL	Photo	Clean	Single wafer oxygen plasma for photoresist removal	Red
+	TRL	asher-TRL	Photo	Clean	Barrel asher for resist removal	Red &Green
+	TRL	coater	Photo	Coat	Manual spin-coater for photoresists	Red &Green
+	TRL	dektak-XT	Metrology	Profile	Stylus Profilerometer	Red
+	TRL	eBeamAu	Deposition	Evaporate	Metal evaporator	Red
+	TRL	ellipsometer-TRL	Metrology	Thickness	Thin film thickness measurement	Red &Green
+	TRL	EV1	Photo	Expose	Contact mask aligner	Red &Green
+	TRL	EV-LC	Photo	Expose	Contact mask aligner	Red &Green
+	TRL	Greenflo	Wet	Acids	Acid processing station	Red &Green
+	TRL	HMDS-TRL	Photo	Bake	HMDS oven	Red &Green
+	TRL	hotplate1	Photo	Bake	Hotplate for lithography	Red &Green
+	TRL	hotplate2	Photo	Bake	Hotplate for lithography	Red &Green
+	TRL	hotplate300	Photo	Bake	Hotplate for lithography	Red &Green
+	TRL	MA-6	Photo	Expose	Contact mask aligner	Red &Green
+	TRL	nanospec	Metrology	Thickness	Thin film thickness measurement	Red &Green
+	TRL	OAI-Flood	Photo	Expose	Flood exposure for image reversal resists	Red &Green
+	TRL	photo-wet-Au	Wet	Solvents	Solvent fume hood with sonicator	Red &Green
+	TRL	photo-wet-l	Wet	Solvents	Wetbench for photoresist development	Red &Green
+	TRL	photo-wet-r	Wet	Solvents	Wetbench for photoresist development	Red &Green
+	TRL	postbake	Photo	Bake	Bake oven 120C	Red &Green
+	TRL	prebakeovn	Photo	Bake	Bake oven 90C	Red &Green
+	TRL	SolventHood-TRL	Wet	Solvents	Solvent fume hood	Red &Green
+	TRL	UVozone-Au	Etch	Clean	Cleans residual organics	Red
+	TRL	varTemp	Photo	Bake	Bake oven for variable temperature	Red