The tool can process many wafers (usually by loading a cassette) without the user's need to attend to each wafer.

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Process	Lab	Tool	Process Category	Subcategory	Description	Color Code
+	EML	anneal-furnace	Diffusion	Bake	Anneal Furnace	EML
+	EML	Box-Furnace	Diffusion	Bake	Anneal Furnace	EML
+	EML	OxidationTube	Diffusion	Oxidation	Oxidation Furnace	EML
+	ICL	5A-GateOx	Diffusion	Oxidation	Diffusion tube for gate oxide growth	Green
+	ICL	5B-Anneal	Diffusion	Bake	Annealing tube	Green
+	ICL	5C-FieldOx	Diffusion	Oxidation	Diffusion tube for wet oxide growth of thicker films	Green
+	ICL	5D-ThickOx	Diffusion	Oxidation	Diffusion tube for wet oxide growth of thicker films	Green
+	ICL	6A-nPoly	Diffusion	CVD	Polysilicon deposition tube for n-type poly Si	Green
+	ICL	6B-Poly	Diffusion	CVD	Polysilicon deposition tube for p-type poly Si	Green
+	ICL	6C-LTO	Diffusion	CVD	Low temperature CVD oxide deposition	Green
+	ICL	6D-Nitride	Diffusion	CVD	Deposition of stoichiometric silicon nitride	Green
+	ICL	AME5000	Etch	RIE	RIE etcher for frontend silicon processes	Green
+	ICL	asher-ICL	Photo	Clean	Single wafer oxygen plasma for photoresist removal	Green
+	ICL	pTrack	Photo	Coat	Automated coater and developer track	Green
+	ICL	concept1	Deposition	PECVD	PECVD deposition of oxides, nitrides, and TEOS	Green
+	ICL	DCVD	Deposition	PECVD	PECVD deposition of oxides, nitrides, and a-Si	Green
+	ICL	eBeam-EVO	Deposition	Evaporate	Metal evaporator of CMOS compatible metals	Green
+	ICL	endura	Deposition	Sputter	Metal sputter deposition	Green
+	ICL	epi-Centura	Deposition	CVD	Not open to public	Green
+	ICL	i-stepper	Photo	Expose	i-line stepper	Red &Green
+	ICL	LAM490B	Etch	RIE	Chlorine based plasma etching of silicon	Green
+	ICL	LAM590-ICL	Etch	RIE	Fluorine based plasma etching of silicon oxide and nitrides	Green
+	ICL	nitrEtch-HotPhos	Wet	Acids	Hot phosphoric nitride etch bath	Green
+	ICL	oxEtch-BOE	Wet	Acids	Silicon dioxide etch bath	Green
+	ICL	premetal-Piranha	Wet	Acids	Piranha resist removal and cleaning station	Green
+	ICL	rainbow	Etch	RIE	Chlorine based plasma etcher for metals	Green
+	ICL	rca-ICL	Diffusion	Clean	Wafer cleaning before diffusion tubes	Green
+	ICL	RTP	Diffusion	Bake	Rapid Thermal Annealing	Green
+	ICL	RTP-Si	Diffusion	Bake	Rapid Thermal Annealing	Green
+	ICL	TMAH-KOHhood	Wet	Acids	Silicon bulk wet etching	Red &Green
+	ICL	UV1280	Metrology	Thickness	Thin film characterization	Green
+	ICL	VTR	Diffusion	CVD	Low stress silicon nitride deposition	Green
+	TRL	A1-GateOx	Diffusion	Oxidation	Thermal Oxidation for Green Silicon Wafers	Green
+	TRL	A2-WetOxBond	Diffusion	Oxidation	Thermal Oxidation and other thermal process for GREEN Si wafers	Green
+	TRL	A3-Sinter	Diffusion	Bake	Sintering for GREEN Si wafers	Green
+	TRL	A4-III-Vanneal	Diffusion	Bake	Annealing for GREEN III-V samples	Red
+	TRL	acid-hood	Wet	Acids	Acid processing station	Red &Green
+	TRL	asherMatrix-TRL	Photo	Clean	Single wafer oxygen plasma for photoresist removal	Red
+	TRL	asher-TRL	Photo	Clean	Barrel asher for resist removal	Red &Green
+	TRL	B1-Au	Diffusion	Oxidation	Gold compatible anneal tube	Red
+	TRL	B2-Ox-alloy-Poly	Diffusion	Oxidation	Thermal Oxidation and LPCVD Polysilicon for RED wafers	Green
+	TRL	B3-DryOx	Diffusion	Oxidation	Thermal Oxidation	Green
+	TRL	B4-Poly	Diffusion	CVD	LPCVD polysilicon for Green wafers	Green
+	TRL	eBeamAu	Deposition	Evaporate	Metal evaporator	Red
+	TRL	eBeamFP	Deposition	Evaporate	Fast pumping metal evaporator	Red
+	TRL	Greenflo	Wet	Acids	Acid processing station	Red &Green
+	TRL	HMDS-TRL	Photo	Bake	HMDS oven	Red &Green
+	TRL	LAM590-TRL	Etch	RIE	Fluorine based plasma etching of oxide and nitrides	Red
+	TRL	postbake	Photo	Bake	Bake oven 120C	Red &Green
+	TRL	prebakeovn	Photo	Bake	Bake oven 90C	Red &Green
+	TRL	rca-TRL	Diffusion	Clean	Wafer cleaning before diffusion tubes	Green
+	TRL	sts-Pegasus	Etch	DRIE	Deep reactive ion etcher for silicon	Red
+	TRL	varTemp	Photo	Bake	Bake oven for variable temperature	Red